NANO/COMP: Hot-electron Lithography

Doug Bailey (
Tue, 1 Dec 1998 9:38:43 -0500

Scientists at IBM Watson have come up with an alternative to the electron, ion and X-ray lithography techniques that have been proposed to print integrated circuits. Hot-electron emission lithography is the basis for a projection system that can print 160 nm lines on an entire wafer in an e-beam resist.

"Nanotech Research Ratchets Up a Notch at IBM", EET 11/30/98